Development of quantitative laser ionization mass spectrometry (LIMS). Final report, 1 Aug 87-1 Jan 90

Technical Report · Tue Jun 04 04:00:00 EDT 1991

OSTI ID:5764725

Odom, R W

The objective of the research was to develop quantitative microanalysis methods for dielectric thin films using the laser ionization mass spectrometry (LIMS) technique. The research involved preparation of thin (5,000 A) films of SiO2, Al2O3, MgF2, TiO2, Cr2O3, Ta2O5, Si3N4, and ZrO2, and doping these films with ion implant impurities of 11B, 40Ca, 56Fe, 68Zn, 81Br, and 121Sb. Laser ionization mass spectrometry (LIMS), secondary ion mass spectrometry (SIMS) and Rutherford backscattering spectrometry (RBS) were performed on these films. The research demonstrated quantitative LIMS analysis down to detection levels of 10-100 ppm, and led to the development of (1) a compound thin film standards product line for the performing organization, (2) routine LIMS analytical methods, and (3) the manufacture of high speed preamplifiers for time-of-flight mass spectrometry (TOF-MS) techniques.

• Research Organization: Evans (Charles) and Associates, Redwood City, CA (United States)
• OSTI ID: 5764725
• Report Number(s): PB-92-122902/XAB; CEVANS--057/FR-8901; CNN: NSF-ISI87-00019
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102* -- Chemical & Spectral Procedures
ALKALINE EARTH ISOTOPES
ALKALINE EARTH METAL COMPOUNDS
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
AMPLIFIERS
ANTIMONY 121
ANTIMONY ISOTOPES
BACKSCATTERING
BORON 11
BORON ISOTOPES
BROMINE 81
BROMINE ISOTOPES
CALCIUM 40
CALCIUM ISOTOPES
CHALCOGENIDES
CHROMIUM COMPOUNDS
CHROMIUM OXIDES
COMPARATIVE EVALUATIONS
DIELECTRIC MATERIALS
DOPED MATERIALS
ELASTIC SCATTERING
ELECTRONIC EQUIPMENT
EQUIPMENT
EVALUATION
EVEN-EVEN NUCLEI
FILMS
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
INTERMEDIATE MASS NUCLEI
ION IMPLANTATION
IONIZATION
IRON 56
IRON ISOTOPES
ISOTOPES
LASERS
LIGHT NUCLEI
MAGNESIUM COMPOUNDS
MAGNESIUM FLUORIDES
MASS SPECTROSCOPY
MATERIALS
MEASURING INSTRUMENTS
MICROANALYSIS
NITRIDES
NITROGEN COMPOUNDS
NUCLEI
ODD-EVEN NUCLEI
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
PNICTIDES
PREAMPLIFIERS
REFRACTORY METAL COMPOUNDS
RUTHERFORD SCATTERING
SCATTERING
SILICON COMPOUNDS
SILICON NITRIDES
SILICON OXIDES
SPECTROMETERS
SPECTROSCOPY
STABLE ISOTOPES
TANTALUM COMPOUNDS
TANTALUM OXIDES
TECHNOLOGY ASSESSMENT
THIN FILMS
TIME-OF-FLIGHT SPECTROMETERS
TITANIUM COMPOUNDS
TITANIUM OXIDES
TRANSITION ELEMENT COMPOUNDS
ZINC 68
ZINC ISOTOPES
ZIRCONIUM COMPOUNDS
ZIRCONIUM OXIDES