Properties of TiO/sub 2/ and SiO/sub 2/ thin films deposited using ion assisted deposition
Journal Article
·
· Appl. Opt.; (United States)
TiO/sub 2/ and SiO/sub 2/ films deposited using ion assisted deposition are investigated as a function of ion energy and current density. Optical constants, possible ion source contaminants, and optical scatter are examined for samples deposited at ambient (approx.75/sup 0/C) and elevated (approx.250/sup 0/C) substrate temperatures.
- Research Organization:
- University of New Mexico, Department of Electrical Engineering, Albuquerque, New Mexico 87131
- OSTI ID:
- 5760067
- Journal Information:
- Appl. Opt.; (United States), Journal Name: Appl. Opt.; (United States) Vol. 24:4; ISSN APOPA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
BEAMS
CHALCOGENIDES
CURRENT DENSITY
DEPOSITION
ENERGY BEAM DEPOSITION
ENERGY DEPENDENCE
EVAPORATION
FILMS
IMPURITIES
ION BEAMS
MODIFICATIONS
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
PRESSURE DEPENDENCE
QUANTITY RATIO
SILICON COMPOUNDS
SILICON OXIDES
SURFACE COATING
TEMPERATURE DEPENDENCE
THIN FILMS
TITANIUM COMPOUNDS
TITANIUM OXIDES
TRANSITION ELEMENT COMPOUNDS
VACUUM EVAPORATION
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
BEAMS
CHALCOGENIDES
CURRENT DENSITY
DEPOSITION
ENERGY BEAM DEPOSITION
ENERGY DEPENDENCE
EVAPORATION
FILMS
IMPURITIES
ION BEAMS
MODIFICATIONS
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHASE TRANSFORMATIONS
PHYSICAL PROPERTIES
PRESSURE DEPENDENCE
QUANTITY RATIO
SILICON COMPOUNDS
SILICON OXIDES
SURFACE COATING
TEMPERATURE DEPENDENCE
THIN FILMS
TITANIUM COMPOUNDS
TITANIUM OXIDES
TRANSITION ELEMENT COMPOUNDS
VACUUM EVAPORATION