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Properties of TiO/sub 2/ and SiO/sub 2/ thin films deposited using ion assisted deposition

Journal Article · · Appl. Opt.; (United States)
DOI:https://doi.org/10.1364/AO.24.000486· OSTI ID:5760067
TiO/sub 2/ and SiO/sub 2/ films deposited using ion assisted deposition are investigated as a function of ion energy and current density. Optical constants, possible ion source contaminants, and optical scatter are examined for samples deposited at ambient (approx.75/sup 0/C) and elevated (approx.250/sup 0/C) substrate temperatures.
Research Organization:
University of New Mexico, Department of Electrical Engineering, Albuquerque, New Mexico 87131
OSTI ID:
5760067
Journal Information:
Appl. Opt.; (United States), Journal Name: Appl. Opt.; (United States) Vol. 24:4; ISSN APOPA
Country of Publication:
United States
Language:
English