Plasma immersion ion implantation. (Latest citations from the EI Compendex*plus database). Published Search
Technical Report
·
OSTI ID:574942
The bibliography contains citations concerning plasma immersion ion implantation (PIII) and equipment. PIII is a new technique to implant plasma ions into materials for surface modification and treatment. Topics include plasma nitriding, semiconductor doping, ion energy distribution, ion dose, pulsed plasma, metal plasma, and defect passivation. References also review applications in semiconductor device and integrated circuit manufacture, silicon material fabrication, aerospace bearings, carbon coatings on metals, and ceramic coatings. (Contains 50-250 citations and includes a subject term index and title list.) (Copyright NERAC, Inc. 1995)
- Research Organization:
- NERAC, Inc., Tolland, CT (United States)
- OSTI ID:
- 574942
- Report Number(s):
- PB-98-852064/XAB; TRN: 80752415
- Resource Relation:
- Other Information: PBD: Jan 1998
- Country of Publication:
- United States
- Language:
- English
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