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Electrical resistivity of the heavy-fermion system CePtSi under pressure

Journal Article · · Physical Review, B: Condensed Matter; (USA)
 [1];  [2]
  1. Department of Physics, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan, Republic of China (TW)
  2. Materials Research Laboratories-Industrial Technology Research Institute, Chutung, Hsinchu 31015, Taiwan (Republic of China)
The electrical resistivity of the heavy-fermion system CePtSi has been measured under pressures up to 15 kbar and at temperatures from 1.2 to 300 K. With increasing pressure {ital P}, the room-temperature magnetic resistivity {rho}{sub {ital m}} for CePtSi, {rho}{sub {ital m}}(CePtSi)={rho}(CePtSi){minus}{rho}(LaPtSi) and the temperature {ital T}{sub {ital m}}, at which {rho}{sub {ital m}} takes a maximum, increase, whereas the {rho}{sub {ital m}} at low temperatures (for instance at {ital T}=4.2 K) decreases. These results can be understood on the basis of competition between Kondo-lattice behavior and mixed-valence effects scaled by the lattice spacing. The correspondence between the pressure effect in CePTSi and the alloying effect in Ce(Pt{sub 1{minus}{ital x}}Ni{sub {ital x}})Si is discussed as a function of unit-cell volume. In addition, a comparison of this compound with other heavy-fermion systems, such as CeAl{sub 3}, CeCu{sub 2}Si{sub 2}, and CeCu{sub 6} is included.
OSTI ID:
5734111
Journal Information:
Physical Review, B: Condensed Matter; (USA), Journal Name: Physical Review, B: Condensed Matter; (USA) Vol. 43:4; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English

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