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In situ extended x-ray absorption fine structure spectroscopy of thin-film nickel hydroxide electrodes

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.104489· OSTI ID:5733544
; ;  [1]; ;  [2]
  1. General Motors Research Laboratories, Warren, Michigan 48090 (US)
  2. Department of Physics, Case Western Reserve University, Cleveland, Ohio 44106 (USA)

A convenient {ital in} {ital situ} electrochemical cell has been developed which permits x-ray absorption measurements on thin-film electrodes under electrochemical polarization. Extended x-ray absorption fine structure spectra from highly disordered {alpha}-Ni(OH){sub 2} films, before and after polarization, provided quantitative results on the lattice contraction accompanying oxidation. Upon oxidation of {alpha}-Ni(OH){sub 2}, the Ni-O distance contracted from 2.05 to 1.86 A, and the Ni-Ni distance contracted from 3.09 to 2.82 A. The observed 10% contraction in the brucite plane is consistent with the 3.67 nickel valence in a K(NiO{sub 2}){sub 3} phase. The present technique extends x-ray absorption spectroscopy to the study of a variety of unstable materials not amenable to {ital ex} {ital situ} techniques.

DOE Contract Number:
AC02-76CH00016
OSTI ID:
5733544
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 58:8; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English