High-resolution imaging with multilayer soft x-ray, EUV, and FUV telescopes of modest aperture and cost

Conference · Sun Sep 01 04:00:00 EDT 1991 · Proceedings of SPIE - The International Society for Optical Engineering

DOI:https://doi.org/10.1117/12.46733· OSTI ID:5729692

Walker II, Arthur B. C. ^[1]; Lindblom, Joakim F. ^[1]; Timothy, J. Gethyn ^[1]; Hoover, Richard B. ^[2]; Barbee Jr., Troy W. ^[3]; Baker, Phillip C. ^[4]; Powell, Forbes R. ^[5]

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1. Stanford Univ., CA (United States)
2. NASA Marshall Space Flight Center (MSFC), Huntsville, AL (United States)
3. Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
4. Baker Consulting, Walter Creek, CA (United States)
5. Luxel Inc., Friday Harbor, WA (United States)

The development of multilayer reflective coatings now permits soft X-ray, EUV and FUV radiation to be efficiently imaged by conventional normal incidence optical configurations. Telescopes with quite modest apertures can, in principle, achieve images with resolutions which would require apertures of 1.25 meters or more at visible wavelengths. The progress is reviewed which has been made in developing compact telescopes for ultra-high resolution imaging of the sun at soft X-ray, EUV and FUV wavelengths, including laboratory test results and astronomical images obtained with rocket-borne multilayer telescopes. The factors are discussed which limit the resolution which has been achieved so far, and the problems which must be addressed to attain, and surpass the 0.1 arc-second level. The application of these technologies to the development of solar telescopes for future space missions is also described.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 5729692
• Report Number(s): UCRL-JC--107052; CONF-910450--9; ON: DE91012085
• Conference Information: Journal Name: Proceedings of SPIE - The International Society for Optical Engineering Journal Volume: 1494
• Country of Publication: United States
• Language: English

Related Subjects

440600* -- Optical Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
APERTURES
CARBIDES
CARBON COMPOUNDS
COATINGS
CONTROL EQUIPMENT
DESIGN
ELECTROMAGNETIC RADIATION
EQUIPMENT
EXTREME ULTRAVIOLET RADIATION
FAR ULTRAVIOLET RADIATION
FILTERS
IMAGES
IONIZING RADIATIONS
OPENINGS
OPTICAL FILTERS
PERFORMANCE
RADIATIONS
REFLECTIVE COATINGS
RESOLUTION
SERVOMECHANISMS
SILICON CARBIDES
SILICON COMPOUNDS
SOFT X RADIATION
TELESCOPES
ULTRAVIOLET RADIATION
X RADIATION