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Collisional coupling and relaxation of N/sub 2/(B/sup 3/Pi/sub g/) and N/sub 2/ (W /sup 3/. delta. /sub u/) vibrational levels in Ar and Ne

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:5720969
Laser excitation from N/sub 2/(A /sup 3/..sigma../sup +//sub u/, v = 0-6) in Ne and Ar carrier gas in a flowing afterglow apparatus has been used to prepare N/sub 2/(B /sup 3/Pi/sub g/) molecules in individual levels from v = 3-10. The subsequent N/sub 2/(B-A) fluorescence intensity was observed to study the coupling and relaxation kinetics of N/sub 2/(B /sup 3/Pi/sub g/, v = 2-10). The decay curves from each level show double (or higher) exponential relaxation. The first component is assigned as primarily the rapid coupling of the N/sub 2/(B /sup 3/Pi/sub g/,v) and N/sub 2/(W /sup 3/..delta../sub u/, v or v+1) levels, however, the N/sub 2/ (B' /sup 3/..sigma../sup -//sub u/, v-4) levels also may be involved for N/sub 2/(B, v> or =5). The slowest decay component represents the subsequent relaxation of the coupled levels. The combination of the two steps is equivalent to apparent stepwise vibrational relaxation of N/sub 2/ (B /sup 3/Pi/sub g/, v), such relaxation occurs even at low Ar pressures because of the large rate constants and long radiative lifetimes of N/sub 2/(B) and N/sub 2/(W). The coupling pattern between N/sub 2/(B) and N/sub 2/(W) is analyzed, and rate constants are assigned to elementary steps in the relaxation sequence and the scheme is evaluated. From the analysis of the slow decay components in argon, estimates (20-90 ..mu..s) are obtained for the radiative lifetimes for the reservoir levels, which are assigned as N/sub 2/ (W /sup 3/..delta../sub u/, v) for N/sub 2/(B, v< or =4) and N/sub 2/(W /sup 3/..delta../sub u/, v or v+1) levels plus N/sub 2/(B'/sup 3/..sigma../sup -//sub u/, v-4) levels, for some cases, for N/sub 2/(B, v> or =5).
Research Organization:
Laboratoire de Spectrometrie Physique, Universite de Grenoble, BP68-38402 Saint-Martin d'Heres, France
OSTI ID:
5720969
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 79:6; ISSN JCPSA
Country of Publication:
United States
Language:
English