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The space-time-averaging procedure and modeling of the RF discharge

Journal Article · · IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States)
DOI:https://doi.org/10.1109/27.106806· OSTI ID:5709112
;  [1]
  1. Dept. of Plasma Physics, Leningrad State Technical Univ., 195251 Leningrad, Politechnichesaya 29 (SU)
This paper reports that one of main difficulties in modeling of RF discharges consists in the great distinction between the characteristic space and time scales of electron and ion motions. Straightforward modeling demands calculations of high accuracy over large space and time intervals. Great simplifications are obtained if the analysis of the fast motions and the averaging over them can be performed analytically and if numerical modeling of relatively simple, averaged slow-scale equations is to be performed. As an example of such an approach, the problem of electrode sheaths in the high-pressure RF discharge is discussed. Time-averaging over fast electron motions with the applied voltage frequency gives analytic expressions for the average electric field and average ionization density. The resulting, relatively simple equations for the ion density profile describe drift, diffusion, ionization, and recombination process. The simple scaling rules, the approximate expressions for the density profile in various regions, the sheath length, the ion density at the plasma-sheath boundary, and the dimensionless criteria for various discharge regimes can be deduced. For the nonself-sustained discharge, it is demonstrated that the ion drag towards the electrode and the diffusion results in significant lowering of the ion density in the sheath compared with the positive column at not too high a pressure. The analytic transition criterion from {alpha} to {gamma} formed of the self-sustained discharge is obtained. The numerical solution of the averaged ion equations yields the result which practically coincide with the results of full-scale modeling.
OSTI ID:
5709112
Journal Information:
IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Plasma Science (Institute of Electrical and Electronics Engineers); (United States) Vol. 19:2; ISSN 0093-3813; ISSN ITPSB
Country of Publication:
United States
Language:
English

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