UV laser photochemistry of CCl/sub 4/ and CCl/sub 3/F

Journal Article · Sat Mar 01 04:00:00 EST 1980 · J. Chem. Phys.; (United States)

OSTI ID:5689520

Tiee, J J; Wampler, F B; Rice, W W

The ArF (193.3 nm) irradiation of CCl/sub 4/ and CCl/sub 3/F has been investigated. The laser photolysis of CCl/sub 4/ yields emission from CCl (A /sup 2/..delta..--X /sup 2/Pi), CCl/sub 2/(/sup 1/B/sub 1/--X /sup 1/A/sub 1/), Cl/sub 2/(A /sup 3/Pi (0/sub u//sup +/) --X /sup 1/..sigma../sub g//sup +/), and other systems. A dye laser was used to obtain the fluorescence excitation spectrum of the CCl radical near the 0--0 band center (A /sup 2/..delta..--X /sup 2/Pi). The CCl (A /sup 2/..delta..) radicals are formed by at least a three photon absorption process and laser fluence dependences are reported for various photofragments. The ArF laser photolysis of CCl/sub 3/F yields results very similar to those of CCl/sub 4/. Possible mechanistic channels are presented for both CCl/sub 4/ and CCl/sub 3/F photolysis which are consistent with the observed photofragments, laser fluence dependences, and known thermochemical data.

• Research Organization: University of California, Los Alamos Scientific Laboratory, Los Alamos, New Mexico 87545
• OSTI ID: 5689520
• Journal Information: J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 72:5; ISSN JCPSA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500* -- Photochemistry
CARBON TETRACHLORIDE
CHEMICAL REACTIONS
CHLORINATED ALIPHATIC HYDROCARBONS
DECOMPOSITION
ELECTROMAGNETIC RADIATION
HALOGENATED ALIPHATIC HYDROCARBONS
LASER RADIATION
ORGANIC CHLORINE COMPOUNDS
ORGANIC COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
PHOTOCHEMICAL REACTIONS
PHOTOLYSIS
RADIATIONS
ULTRAVIOLET RADIATION