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Electrical characteristics of MBE (molecular beam epitaxy)-grown GaAs/sub 1-x/Sb/sub x/ on InP and correlation with film microstructure

Conference ·
OSTI ID:5682425

GaAs/sub 0.5/Sb/sub 0.5/ grown on InP by molecular beam epitaxy (MBE) has been characterized by transmission electron microscopy and variable temperature Hall measurements. Unintentionally doped layers are p-type with measured hole concentrations of 1-3 x 10/sup 16/ cm/sup -3/ at 300K. The behavior of the Hall coefficient as a function of temperature is found to be well-described in the temperature range 30K

Research Organization:
Sandia National Labs., Albuquerque, NM (USA); Illinois Univ., Urbana (USA). Coordinated Science Lab.; Purdue Univ., Lafayette, IN (USA). School of Materials Engineering
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5682425
Report Number(s):
SAND-87-2590C; CONF-880141-1; ON: DE88003841
Country of Publication:
United States
Language:
English