Refraction effects associated with multiphoton ionization and ultrashort-pulse laser propagation in plasma waveguides

Journal Article · Sat Jun 01 04:00:00 EDT 1991 · Optics Letters; (USA)

DOI:https://doi.org/10.1364/OL.16.000835· OSTI ID:5679458

Rankin, R; Capjack, C E ^[1]; Burnett, N H; Corkum, P B ^[2]

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1. Department of Electrical Engineering, University of Alberta, Edmonton, Canada T6G 2G7 (CA)
2. Division of Physics, National Research Council of Canada, Ottawa, Canada K1A OR6 (CA)

The problem of refraction of ultrashort, high-intensity laser pulses in underdense plasmas is discussed in the context of producing long plasma filaments by high {ital f}-number axial focusing of laser beams. For uniform gas targets, it is shown that refraction can clamp the intensity of the focused laser beam at a value near the threshold for multiphoton ionization. In order to make large volumes of underdense plasma with ultrashort pulses, it is necessary to preform a partially ionized filament with a suitable radial electron density profile. Such a structure can act as an indestructible waveguide for ultraintense, subpicosecond laser pulses. Indeed, highly ionized plasma represents the only practical optical material at wavelengths below 50 nm or at intensities above 10{sup 13} W cm{sup {minus}2}.

• OSTI ID: 5679458
• Journal Information: Optics Letters; (USA), Journal Name: Optics Letters; (USA) Vol. 16:11; ISSN 0146-9592; ISSN OPLED
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426002* -- Engineering-- Lasers & Masers-- (1990-)
BEAM PROFILES
ELECTRON DENSITY
IONIZATION
LASER-PRODUCED PLASMA
PHOTOIONIZATION
PLASMA
REFRACTION
WAVE PROPAGATION