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Study of. gamma. -irradiated lithographic polymers by electron spin resonance and electron nuclear double resonance. [Poly(methyl-. cap alpha. -chloroacrylate) (PMCA), poly(methy)-. cap alpha. -fluoroacrylate) (PMFA), poly(methylacrylonitrile) (PMCN)]

Journal Article · · J. Appl. Polym. Sci.; (United States)
 [1];
  1. Wayne State Univ., Detroit, MI

The room temperature gamma irradiation degradation of the lithographic polymers, poly(methylmethacrylate) (PMMA), poly(methyl-..cap alpha..-chloroacrylate) (PMCA), poly(methyl-..cap alpha..-fluoroacrylate) (PMFA), and poly(methylacrylonitrile) (PMCN), have been studied by electron spin resonance and electron nuclear double resonance (ENDOR) to assess their molecular degradation processes of relevance to electron beam lithography. Two classes of radicals are found, chain radicals and chain scission radicals. PMMA and PMCA mainly form chain scission radicals consistent with degradation while for PMCN the resolution is poorer, and this is only probable. PMFA forms mainly chain radicals consistent with predominant crosslinking. The total radical yield is greatest in PMCA and PMCN. ENDOR is used to assess the compactness of the radiation degradation region for PMMA and PMCA and hence the potential resolution of the resist; this appears to be about the same for these methacrylate polymers.

OSTI ID:
5659852
Journal Information:
J. Appl. Polym. Sci.; (United States), Journal Name: J. Appl. Polym. Sci.; (United States) Vol. 27:1; ISSN JAPNA
Country of Publication:
United States
Language:
English