Room temperature oxidation of Ni(110) exposed to high oxygen pressures
Technical Report
·
OSTI ID:5658795
- Florida Univ., Gainesville, FL (USA)
The techniques of high resolution electron energy loss spectroscopy (HREELS), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES), and low energy electron diffraction (LEED) have been used to investigate the thickening of the oxide and hydroxide layers on Ni(110) single crystals at room temperature. Sputter cleaned and annealed samples were exposed to oxygen at pressures between 0.1 to 100 Torr and times of 30 min. to 15 hrs. The XPS data indicate that low pressure oxygen exposures result in the formation of a high binding energy O ls species which is confined to the near surface region of the overlayer film. In comparison with a Ni(OH){sub 2} standard, the high binding energy oxygen species is assigned to the oxygen state for Ni(OH){sub 2}. The oxidation of nickel is divided into three reaction regimes, namely chemisorption, island nucleation and growth to coalescence, and thickening of the coalesced oxide. It has been proposed that the presence of an adsorbed charged oxygen species observed at high oxygen pressures may induce thickening of the oxide according to the Mott theory of field assisted ionic transport. At high pressure oxygen exposures, thickening of the NiO layer does not occur. Any observed increase in the overlayer thickness is confined to growth of the Ni(OH){sub 2} layer located at the near surface region. The ratio of O{sub 2}/H{sub 2}O in the oxidizing environment does not affect the composition of the final overlayer film but only the exposure at which this film is formed. The HREELS data indicate that the hydroxide species are not in an adsorbed chemical state but are due to the formation of Ni(OH){sub 2} in agreement with the XPS data.
- Research Organization:
- Florida Univ., Gainesville, FL (USA)
- Sponsoring Organization:
- DOE/ER
- DOE Contract Number:
- FG05-84ER45155
- OSTI ID:
- 5658795
- Report Number(s):
- DOE/ER/45155-T2; ON: DE89017816
- Country of Publication:
- United States
- Language:
- English
Similar Records
Room-temperature oxidation of Ni(110) at low and atmospheric oxygen pressures
Ambient pressure x-ray photoelectron spectroscopy study of water formation and adsorption under two-dimensional silica and aluminosilicate layers on Pd(111)
Journal Article
·
Sun Mar 31 23:00:00 EST 1996
· Oxidation of Metals
·
OSTI ID:245143
Ambient pressure x-ray photoelectron spectroscopy study of water formation and adsorption under two-dimensional silica and aluminosilicate layers on Pd(111)
Journal Article
·
Mon Feb 24 19:00:00 EST 2020
· Journal of Chemical Physics
·
OSTI ID:1614982
Related Subjects
36 MATERIALS SCIENCE
360105* -- Metals & Alloys-- Corrosion & Erosion
AUGER ELECTRON SPECTROSCOPY
BINDING ENERGY
CHALCOGENIDES
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISORPTION
COHERENT SCATTERING
DIFFRACTION
ELECTRON DIFFRACTION
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY
ENERGY-LOSS SPECTROSCOPY
FILMS
HYDROGEN COMPOUNDS
HYDROXIDES
KINETICS
METALS
NICKEL
NICKEL COMPOUNDS
NICKEL HYDROXIDES
NICKEL OXIDES
NONMETALS
NUCLEATION
OXIDATION
OXIDES
OXYGEN
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
REACTION KINETICS
SCATTERING
SEPARATION PROCESSES
SORPTION
SPECTROSCOPY
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
360105* -- Metals & Alloys-- Corrosion & Erosion
AUGER ELECTRON SPECTROSCOPY
BINDING ENERGY
CHALCOGENIDES
CHEMICAL REACTION KINETICS
CHEMICAL REACTIONS
CHEMISORPTION
COHERENT SCATTERING
DIFFRACTION
ELECTRON DIFFRACTION
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY
ENERGY-LOSS SPECTROSCOPY
FILMS
HYDROGEN COMPOUNDS
HYDROXIDES
KINETICS
METALS
NICKEL
NICKEL COMPOUNDS
NICKEL HYDROXIDES
NICKEL OXIDES
NONMETALS
NUCLEATION
OXIDATION
OXIDES
OXYGEN
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
REACTION KINETICS
SCATTERING
SEPARATION PROCESSES
SORPTION
SPECTROSCOPY
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS