Scanned microfocused neutral beam for use in secondary ion mass spectrometry

Journal Article · Tue Jul 01 04:00:00 EDT 1986 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.573741· OSTI ID:5648309

Eccles, A J; van den Berg, J A; Brown, A; Vickerman, J C

The construction of a gun capable of producing a microfocused (FWHM = 5 ..mu..m) beam of Ar atoms at 10 keV for use in secondary electron and SIMS imaging of insulating samples is described. The design is based on the principle of neutralizing an ion beam by charge transfer subsequent to rastering and microfocusing, and therefore utilizes a final focusing lens with long working distance (60 mm). Neutral beam intensities of up to 20% of the focused ion beam can be produced. The performance of the gun is illustrated by secondary-electron and secondary-ion images of insulators.

• Research Organization: Department of Chemistry, University of Manchester Institute of Science and Technology, P.O. Box 88, Manchester M60 1QD, United Kingdom
• OSTI ID: 5648309
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 4:4; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

640301* -- Atomic
Molecular & Chemical Physics-- Beams & their Reactions
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON 40 BEAMS
ARGON IONS
ATOMIC BEAM SOURCES
ATOMIC BEAMS
BEAM NEUTRALIZATION
BEAM PRODUCTION
BEAMS
CHARGED PARTICLES
DESIGN
ENERGY RANGE
FABRICATION
FOCUSING
ION BEAMS
ION SPECTROSCOPY
IONS
KEV RANGE
KEV RANGE 01-10
NEUTRAL BEAM SOURCES
SPECTROSCOPY