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Photochemical ligand loss as a basis for imaging and microstructure formation in a thin polymeric film

Journal Article · · Journal of the American Chemical Society; (United States)
DOI:https://doi.org/10.1021/ja00182a007· OSTI ID:5638625
; ;  [1]
  1. Univ. of North Carolina, Chapel Hill (United States)

Ligand loss photochemistry occurs in thin polymeric films of poly(Ru(bpy){sub 2}(vpy){sub 2}){sup 2+} (bpy is 2,2{prime}-bipyridine, vpy is 4-vinylpyridine), poly(Ru(Me{sub 2}bpy){sub 2}(vpy){sub 2}){sup 2+} (Me{sub 2}bpy is 4,4{prime}-dimethyl-2,2{prime}-bipyridine), and poly(Ru(Me{sub 4}bpy){sub 2}(vpy){sub 2}){sup 2+} (Me{sub 4}bpy is 4,4{prime},5,5{prime}-tetramethyl-2,2{prime}-bipyridine). These films were formed by reductive electropolymerization of the corresponding 4-vinylpyridine complexes on Pt disk electrodes. Upon photolysis, the ruthenium-pyridyl bonds were cleaved and the polymer was lost, exposing the underlying substrate. The photochemical reaction was used to transfer an image to the films by using masking techniques. In a subsequent step, poly(Os(vbpy){sub 3}){sup 2+} (vbpy is 4-methyl-4{prime}-vinyl-2,2{prime}-bipyridine), which is photochemically stable, was formed selectively in the exposed regions of the electrode by reductive electropolymerization. This procedure gave a laterally resolved, two-component, film-based structure in which there were discrete, spatially segregated regions of Ru{sup II} and Os{sup II}. In a final step, the remaining film containing Ru{sup II} was removed by photolysis. This procedure left an image of the original mask in the poly(Os(vbpy){sub 3}){sup 2+} that remained.

OSTI ID:
5638625
Journal Information:
Journal of the American Chemical Society; (United States), Journal Name: Journal of the American Chemical Society; (United States) Vol. 112:26; ISSN 0002-7863; ISSN JACSA
Country of Publication:
United States
Language:
English