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Title: Apparatus and method for the horizontal, crucible-free growth of silicon sheet crystals

Patent ·
OSTI ID:5624059

Apparatus is provided for continuously forming a silicon crystal sheet from a silicon rod in a non-crucible environment. The rod is rotated and fed toward an RF coil in an inert atmosphere so that the upper end of the rod becomes molten and the silicon sheet crystal is pulled therefrom substantially horizontally in a continuous strip. A shorting ring may be provided around the rod to limit the heating to the upper end only. Argon gas can be used to create the inert atmosphere within a suitable closed chamber. By use of this apparatus and method, a substantially defect-free silicon crystal sheet is formed which can be used for micro-circuitry chips or solar cells.

DOE Contract Number:
AC02-83CH10093
Assignee:
Dept. of Energy
Application Number:
ON: DE85011588
OSTI ID:
5624059
Country of Publication:
United States
Language:
English