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Title: Method and apparatus for conducting variable thickness vapor deposition

Patent ·
OSTI ID:5619782

A method of vapor depositing metal on a substrate in variable thickness comprises conducting the deposition continuously without interruption to avoid formation of grain boundaries. To achieve reduced deposition in specific regions a thin wire or ribbon blocking body is placed between source and substrate to partially block vapors from depositing in the region immediately below.

Research Organization:
Mound Plant (MOUND), Miamisburg, OH (United States)
DOE Contract Number:
AC04-76DP00053
Assignee:
Dept. of Energy
Application Number:
ON: DE85011653
OSTI ID:
5619782
Country of Publication:
United States
Language:
English