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Ultrasonic relaxation of interstitial aluminum in irradiated silicon

Journal Article · · Physical Review, B: Condensed Matter; (USA)
 [1];  [2]
  1. Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801 (USA) Metallurgy Division, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (USA)
  2. Materials Research Laboratory and Department of Physics, University of Illinois at Urbana-Champaign, 1110 West Green Street, Urbana, Illinois 61801 (USA)
An ultrasonic relaxation arising from a nonequilibrium charge state of interstitial aluminum is observed in aluminum-doped silicon irradiated with electrons at 10 K. This relaxation is present in the {ital C}{prime} shear mode while the sample is exposed to white light, electron irradiation, or {gamma} rays. The thermally activated reorientation rate of the defect is 7.7{times}10{sup 10} exp(({minus}5.1 meV)/{ital kT}) sec{sup {minus}1}. Based on the mode dependence of the relaxation, a defect model is suggested which follows naturally from the known structure of lower charge states of interstitial aluminum. This model has the defect electrically neutral, with the aluminum atom on the site which is tetrahedral in the perfect lattice and with the surrounding silicon atoms displaced into a tetragonal configuration.
DOE Contract Number:
AC02-76ER01198
OSTI ID:
5615879
Journal Information:
Physical Review, B: Condensed Matter; (USA), Journal Name: Physical Review, B: Condensed Matter; (USA) Vol. 43:12; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English