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Novel method of patterning YBaCuO superconducting thin films

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.102448· OSTI ID:5614261
; ;  [1];  [2]
  1. Microelectronics Sciences Laboratories and Center for Telecommunication Research, 1312 Mudd, Columbia University, New York, New York 10027 (US)
  2. IBM T. J. Watson Research Center, Yorktown Heights, New York 10598

A unique method of patterning YBaCuO thin films based on the inhibition of superconductivity by Si-YBaCuO intermixing has been developed. In the experiment, a thin Si film was first evaporated on a MgO substrate and subsequently patterned using laser direct-write etching. Multilayered YBaCuO thin films were then deposited by {ital e}-beam evaporation and annealed in a rapid thermal annealing system for 30--90 s at 980 {degree}C. The YBaCuO film deposited on the silicon regions became insulating. Auger depth profiling measurements indicate that Si-YBaCuO intermixing had occurred in these areas. Between the insulating regions, narrow YBaCuO superconducting lines were formed. For both 10-{mu}m-wide, 1-mm-long and 2.5-{mu}m-wide, 80-{mu}m-long lines, the {ital T}{sub {ital c}} was observed above 76 K. The critical current density of the lines was measured to be 300 A/cm{sup 2} at 75 K. This patterning technique may be useful for fabrication of high {ital T}{sub {ital c}} superconducting interconnects and devices.

OSTI ID:
5614261
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:9; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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