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U.S. Department of Energy
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Polysilicon thin films and interfaces

Conference ·
OSTI ID:5590771
 [1];  [2];  [3]
  1. Hewlett-Packard Co., Palo Alto, CA (United States)
  2. Integrated Technology Associates, Mountain View, CA (US)
  3. Massachusetts Eye and Ear Infirmary, Boston, MA (United States)
This volume contains the proceedings of a symposium on polysilicon thin films and interfaces, held as part of the 1990 Materials Research Society Spring Meeting. Topics covered include: crystal grown fo silicon and germanium wafers for photovoltaic devices, microanalysis of tungsten silicide interface, thermal processing of polysilicon thin films, and electrical and optical properties of polysilicon sheets for photovoltaic devices.
OSTI ID:
5590771
Report Number(s):
CONF-900466--; ISBN: 1-55899-071-2
Country of Publication:
United States
Language:
English