Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

High temperature removal of H2S from reducing gas

Patent ·
OSTI ID:5580546
High temperature reducing gas is scrubbed of H2S and other gaseous sulfur compounds at high temperature (>8000 K.) in a highly efficient regenerative process. The scrubbing is effected in at least two sequential stages. The first stage scrubbing medium is a molten salt comprised essentially of molten alkali carbonates, sulfides, and hydroxides. The second stage is optionally either a metallic melt comprised of copper or a second molten salt. The copper melt is regenerated with air. The salt melts are regenerated with steam and/or cO2. When two or more salt stages are used, they are regenerated stagewise countercurrently to the scrubbing sequence.
Assignee:
IFI; EDB-82-078830
Patent Number(s):
US 4207298
OSTI ID:
5580546
Country of Publication:
United States
Language:
English