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Surface structure of radical 3 times radical 3 R 30 degree Cl/Ni(111) determined using low-temperature angle-resolved photoemission extended fine structure

Journal Article · · Physical Review, B: Condensed Matter; (United States)
; ; ; ;  [1]
  1. Department of Chemistry, University of California, Berkeley, California 94720 (United States) Materials and Chemical Sciences Division, Lawrence Berkeley Laboratory, 1 Cyclotron Road, Berkeley, California 94720 (United States)
A surface structural study of the {radical}3 {times} {radical}3 {ital R}30{degree} Cl/Ni(111) adsorbate system was made using low-temperature angle-resolved photoemission extended fine structure. The experiments were performed along two emission directions, (111) and (110), and at two temperatures, 120 and 300 K. The multiple-scattering spherical-wave analysis determined that the Cl atom adsorbs in the fcc threefold hollow site, 1.837(8) A above the first nickel layer, with a Cl-Ni bond length of 2.332(6) A, and an approximate 5% contraction between the first and the second nickel layers (the errors in parentheses are statistical standard deviations only).
DOE Contract Number:
AC03-76SF00098
OSTI ID:
5579492
Journal Information:
Physical Review, B: Condensed Matter; (United States), Journal Name: Physical Review, B: Condensed Matter; (United States) Vol. 44:24; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English