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Title: Micron-thin Nb films recovered from Mbar shock pressures

Conference ·
OSTI ID:5576475

Niobium films of thickness 1, 2.5, 5, and 10 {mu}m were subjected to shock pressures of 0.72 and 0.97 Mbar. The recovery technique and the results of microstructural investigations of the recovered films are described. 2 refs., 1 fig.

Research Organization:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOD
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5576475
Report Number(s):
UCRL-100833; CONF-890812-59; ON: DE90001509
Resource Relation:
Conference: American Physical Society topical conference on shock compression of condensed matter, Albuquerque, NM (USA), 14-17 Aug 1989
Country of Publication:
United States
Language:
English