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Plasma density profiles and finite bandwidth effects on electron heating

Conference ·
OSTI ID:5563310
Intense, p-polarized microwaves are incident on an inhomogeneous plasma in a cylindrical waveguide. Microwaves are mainly absorbed by resonant absorption near the critical surface (where the plasma frequency, ..omega../sub pe/, equals the microwave frequency, ..omega../sub o/). The localized plasma waves strongly modify the plasma density. Step-plateau density profiles or a cavity are created depending on the plasma flow speed. Hot electron production is strongly affected by the microwave bandwidth. The hot electron temperature varies as T/sub H/ is proportional to (..delta.. ..omega../..omega..)/sup -0/ /sup 25/. As the hot electron temperature decreases with increasing driver bandwidth, the hot electron density increases. This increase is such that the heat flux into the overdense region (Q is proportional to eta/sub H/T/sub H//sup 3/ /sup 2/) is nearly constant.
Research Organization:
California Univ., Davis (USA). Dept. of Applied Science
DOE Contract Number:
EY-76-C-04-0789
OSTI ID:
5563310
Report Number(s):
SAND-80-0608C; CONF-800418-2
Country of Publication:
United States
Language:
English