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Nuclear characterizations and applications of boron-containing materials

Conference · · Transactions of the American Nuclear Society; (USA)
OSTI ID:5554567
Materials either doped with traces of boron or containing this element as a matrix component have important technological and research applications. For most applications in technology, semiconductor doping, chemical vapor deposition of glass films, and optical waveguide fiber manufacture, boron levels or distribution must be controlled precisely. Thus, methods for quantitation of boron are needed, and its analytical chemistry still receives considerable study. Several nondestructive nuclear methods are described in this paper that have unique capabilities for quantitative analyses of boron at the trace and macro levels. Excellent high-sensitivity determinations are based on alpha track counting. For micro- and macroanalyses, the nuclear track technique using the {sup 10}B(n,{alpha}){sup 7} Li reaction has been applied to map qualitatively the distribution of boron in borosilicate glass and in optical waveguide glass and fibers. Boron in the 1.59 to 7.75% range is determinable in silicate glasses. Similar information has also been obtained by prompt gamma neutron activation. Neuron depth profiling of boron in glass has been performed also. Results for several of these methods are reported.
OSTI ID:
5554567
Report Number(s):
CONF-880601--
Conference Information:
Journal Name: Transactions of the American Nuclear Society; (USA) Journal Volume: 56
Country of Publication:
United States
Language:
English