As-sputtered electrochromic films of nickel oxide

Journal Article · Mon Jul 01 04:00:00 EDT 1991 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)

DOI:https://doi.org/10.1116/1.577245· OSTI ID:5554459

Wruck, D A; Dixon, M A; Rubin, M; Bogy, S N ^[1]

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1. Applied Science Division, Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (US)

Electrochromic nickel oxide films were deposited by radio-frequency magnetron sputtering of a Ni target in gas mixtures of Ar and O{sub 2}. When electrochemically cycled in 0.1 N KOH solution, large reversible changes in visible absorption were obtained within the first 10 bleach/color cycles. Films which showed the greatest changes in optical properties and charge capacity were produced within a narrow range of oxygen flow rates. The coloration efficiency was found to be insensitive to the sputtering conditions and stoichiometry, with a value of 34{plus minus}4 cm{sup 2}C{sup {minus}1} at 550 nm. This indicates that microstructure and charge capacity determine the absorption coefficient. The reaction rate was found to depend on the concentration of OH{sup {minus}} in the electrolyte, indicating that OH{sup {minus}} diffusion in the electrolyte limits the rate of reaction.

• DOE Contract Number: AC03-76SF00098
• OSTI ID: 5554459
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:4; ISSN JVTAD; ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
ABSORPTIVITY
CHALCOGENIDES
CHEMICAL COATING
COLORATION
CRYSTAL STRUCTURE
DEPOSITION
ELECTRO-OPTICAL EFFECTS
ELECTROCHEMICAL COATING
ELECTROCHROMISM
ELEMENTS
FILMS
HYDROXYL RADICALS
METALS
MICROSTRUCTURE
NICKEL
NICKEL COMPOUNDS
NICKEL OXIDES
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
RADICALS
SPUTTERING
SURFACE COATING
THIN FILMS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS