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As-sputtered electrochromic films of nickel oxide

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
DOI:https://doi.org/10.1116/1.577245· OSTI ID:5554459
; ; ;  [1]
  1. Applied Science Division, Lawrence Berkeley Laboratory, University of California, Berkeley, California 94720 (US)

Electrochromic nickel oxide films were deposited by radio-frequency magnetron sputtering of a Ni target in gas mixtures of Ar and O{sub 2}. When electrochemically cycled in 0.1 N KOH solution, large reversible changes in visible absorption were obtained within the first 10 bleach/color cycles. Films which showed the greatest changes in optical properties and charge capacity were produced within a narrow range of oxygen flow rates. The coloration efficiency was found to be insensitive to the sputtering conditions and stoichiometry, with a value of 34{plus minus}4 cm{sup 2}C{sup {minus}1} at 550 nm. This indicates that microstructure and charge capacity determine the absorption coefficient. The reaction rate was found to depend on the concentration of OH{sup {minus}} in the electrolyte, indicating that OH{sup {minus}} diffusion in the electrolyte limits the rate of reaction.

DOE Contract Number:
AC03-76SF00098
OSTI ID:
5554459
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 9:4; ISSN JVTAD; ISSN 0734-2101
Country of Publication:
United States
Language:
English