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Infrared spectroscopic study of the adsorption and dissociation of methyl halides on silica-supported Pd

Journal Article · · Journal of Catalysis; (United States)
The adsorption and dissociation of CH[sub 3]Cl and CH[sub 3]I have been investigated by means of infrared spectroscopy at 193-573 K. Both compounds adsorb molecularly on Pd/SiO[sub 2] at 193 K and interact strongly with the OH groups of silica to form H-bridge-bonded alkyl halides. This was exhibited by a significant attenuation of the absorption band at 3744 cm[sup [minus]1] and by the development of a broad dissociation of CH[sub 3]Cl, was detected first at 263 K and was eliminated above 373 K. Preadsorbed CO and O exerted no observable influence on the adsorption and dissociation CH[sub 3]Cl. However, potassium additive promoted the dissociation and somewhat stabilized the CH[sub 3] group on the surface. The dissociation of CH[sub 3]I occurred at lower temperature and to a greater extent than that of CH[sub 3]Cl. 31 refs., 9 figs., 1 tab.
OSTI ID:
5548473
Journal Information:
Journal of Catalysis; (United States), Journal Name: Journal of Catalysis; (United States) Vol. 143:1; ISSN 0021-9517; ISSN JCTLA5
Country of Publication:
United States
Language:
English