Laser ablation synthesis and characterization of nitride coatings
- Univ. of South Alabama, Mobile, AL (United States)
- Univ. of Tennessee Space Inst., Tullahoma, TN (United States)
Thin film nitride coatings were deposited on Si (100) substrates by the pulsed laser deposition (PLD) technique. The PLD method is a unique process for depositing high quality thin films with novel microstructure and properties. Boron nitride (BN) films deposited on Si (100) substrates have a higher percentage of c-BN phases when processed in higher nitrogen partial pressure. Titanium nitride films deposited on Si (100) substrates at a higher temperature (600 C) have better quality crystallinity and higher hardness and Young`s modulus values than films deposited at lower temperatures. Nanoindentation technique was used to measure the mechanical properties of thin films. The film orientation was determined by x-ray diffraction. Atomic force microscopy (AFM) technique was used to understand the growth structure of the films.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 554079
- Journal Information:
- Journal of Materials Engineering and Performance, Journal Name: Journal of Materials Engineering and Performance Journal Issue: 5 Vol. 6; ISSN 1059-9495; ISSN JMEPEG
- Country of Publication:
- United States
- Language:
- English
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