Viscous slip along grain boundaries in chlorine-doped silicon nitride
Journal Article
·
· Journal of the American Ceramic Society
- Kyoto Inst. of Tech. (Japan). Dept. of Materials
- Osaka Univ. (Japan). Inst. of Scientific and Industrial Research
- Univ. Bayreuth (Germany). Inst. fuer Materialforschung
The effect of chlorine doping on the anelastic-relaxation and torsional-creep behavior of a silicon nitride (Si{sub 3}N{sub 4}) polycrystalline body was studied. Two model polycrystals--one undoped and the other doped with a small fracture of chlorine--were investigated. Their microstructures consisted of equiaxed and well-faceted Si{sub 3}N{sub 4} grains whose boundaries were separated by a continuous, nanometer-sized film of silica (SiO{sub 2}) glass. The actual presence of chlorine in the doped polycrystal was ascertained by ion chromatography and is thought to be enriched at the grain boundaries. The effect o chlorine on the intergranular film structure was characterized by high-resolution electron microscopy. The micromechanical response of the SiO{sub 2} grain boundary under shear stress was monitored up to very high temperatures (i.e., {approximately}2,000 C) by internal-friction and torsional-creep experiments. The presence of the chlorine dopant, which is a network modifier of SiO{sub 2} glass that also causes a widening of the grain-boundary film, significantly lowered the bulk viscosity of the residual glass. As a consequence of the change in grain-boundary chemistry, the internal-friction curve of the chlorine-doped material shifted toward lower temperatures and the torsional-creep rate markedly increased, as compared to the undoped material. According to a viscoelastic model of the Si{sub 3}N{sub 4} polycrystal, the internal-friction data resulted as a superposition of two individual components: (i) a relaxation peak that is related to the anelastic slip mechanism along grain boundaries and (ii) a background component that results from an irreversible diffusional-creep mechanism.
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 554020
- Journal Information:
- Journal of the American Ceramic Society, Journal Name: Journal of the American Ceramic Society Journal Issue: 9 Vol. 80; ISSN 0002-7820; ISSN JACTAW
- Country of Publication:
- United States
- Language:
- English
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