RF surface resistance of high-T /SUB c/ superconducting Al5 thin films

Journal Article · Sun May 01 04:00:00 EDT 1983 · IEEE Trans. Magn.; (United States)

DOI:https://doi.org/10.1109/TMAG.1983.1062444· OSTI ID:5535769

Allen, L H; Beasley, M; Hammond, R; Turneaure, J

A calorimetric apparatus for measuring the surface resistance of thin film superconductors has been developed and applied to the study of high-T /SUB c/ A15 materials. The apparatus is capable of measurement at 8.6 GHz over a temperature range of 1.5-20k. The samples were deposited using electron-beam coevaporation on sapphire substrates. The effective magnetic loss tangent of the sapphire substrates has been observed to have a value as low as 4.2 x 10/sup -8/. Surface resistance data are presented for the A15's Nb/sub 3/Sn and V/sub 3/Si and for the elements Nb and Sn. Structure in the surface resistance of A15's indicate material inhomogeneities that have been linked to temperature variations during deposition. Use of an improved style of substrate holder has greatly reduced this structure.

• Research Organization: W.W. Hansen Labs of Physics, Stanford University, Stanford, CA 94305
• OSTI ID: 5535769
• Journal Information: IEEE Trans. Magn.; (United States), Journal Name: IEEE Trans. Magn.; (United States) Vol. 19:3; ISSN IEMGA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104 -- Metals & Alloys-- Physical Properties
360603 -- Materials-- Properties
420201* -- Engineering-- Cryogenic Equipment & Devices
656102 -- Solid State Physics-- Superconductivity-- Acoustic
Electronic
Magnetic
Optical
& Thermal Phenomena-- (-1987)
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALLOYS
ALUMINIUM
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
CALORIMETERS
CHALCOGENIDES
COATINGS
CORUNDUM
DEPOSITION
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ELECTRODEPOSITED COATINGS
ELECTRODEPOSITION
ELECTROLYSIS
ELEMENTS
FILMS
HETEROGENEOUS EFFECTS
INTERMETALLIC COMPOUNDS
LYSIS
MEASURING INSTRUMENTS
METALS
MINERALS
NIOBIUM
NIOBIUM ALLOYS
NIOBIUM BASE ALLOYS
OXIDE MINERALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
RF SYSTEMS
SAPPHIRE
SEMIMETALS
SILICIDES
SILICON
SILICON COMPOUNDS
SUBSTRATES
SUPERCONDUCTING FILMS
SURFACE COATING
SURFACE PROPERTIES
TECHNETIUM
THIN FILMS
TIN
TIN ALLOYS
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
VANADIUM COMPOUNDS
VANADIUM SILICIDES