Pulsed sheath dynamics in a small cylindrical bore with an auxiliary electrode for plasma immersion ion implantation

Journal Article · Mon Dec 01 04:00:00 EST 1997 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.872607· OSTI ID:553024

Zeng, X C; Liu, A G; Kwok, T K; Chu, P K; Tang, B Y ^[1]

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1. Department of Physics and Materials Science, City University of Hong Kong, 83 Tat Chee Avenue, Kowloon (Hong Kong)

The temporal evolution of the plasma sheath in a small cylindrical bore with an auxiliary electrode is calculated for zero-rise-time voltage pulses. The ion density, flux, dose, ion energy distribu-tion, and electric field are determined by solving Poisson{close_quote}s equation and the equations of ion motion and continuity using finite difference methods. Our results indicate that the implantation time is about halved and slightly more than 50{percent} of the ions possess impact energy higher than the maximum achieved when an auxiliary electrode is absent. The resulting ion flux, ion current, as well as ion energy distribution, are also determined. {copyright} {ital 1997 American Institute of Physics.}

• OSTI ID: 553024
• Journal Information: Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 12 Vol. 4; ISSN PHPAEN; ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
COLLISIONLESS PLASMA
ELECTRODES
ION IMPLANTATION
PLASMA DENSITY
PLASMA SHEATH