Soft x-ray lithography at Berkeley's Advanced Light Source

Conference · Wed May 01 00:00:00 EDT 1991

OSTI ID:5529271

Carruthers, J ^[1]; Oldham, W ^[2]; Attwood, D ^[3]

---

1. Intel Corp., Santa Clara, CA (USA)
2. California Univ., Berkeley, CA (USA)
3. Lawrence Berkeley Lab., CA (USA) California Univ., Berkeley, CA (USA)

This report discusses: the DARPA x-ray lithography program, uniqueness of the advanced light source; the advanced light source: on schedule for 1993; an ALS undulator beamline, an ALS bending magnet beamline; x-ray multilayer mirror technology, x-ray lithography at IBM; projection lithography using soft x-rays; resist characterization and profile simulation; and industrial perspective on x-ray lithography.

• Research Organization: Lawrence Berkeley Lab., CA (USA)
• Sponsoring Organization: DOE; USDOE, Washington, DC (USA)
• DOE Contract Number: AC03-76SF00098
• OSTI ID: 5529271
• Report Number(s): LBL-30431; CONF-910185--; ON: DE91013756
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
430100* -- Particle Accelerators-- Design
Development
& Operation
BEAM BENDING MAGNETS
ELECTRICAL EQUIPMENT
ELECTROMAGNETS
EQUIPMENT
MAGNETS
MEETINGS
MIRRORS
RADIATION SOURCES
RESEARCH PROGRAMS
SYNCHROTRON RADIATION SOURCES
WIGGLER MAGNETS
X-RAY EQUIPMENT
X-RAY SOURCES