Photochemistry of tertiary nitrosoalkanes in solid polymer matrices: a promising new class of organic materials for holographic recording with semiconductor lasers

Journal Article · Wed Oct 14 04:00:00 EDT 1987 · J. Am. Chem. Soc.; (United States)

DOI:https://doi.org/10.1021/ja00255a038· OSTI ID:5527111

Pinsl, J; Gehrtz, M; Reggel, A; Braeuchle, C

The authors have investigated a new class of photopolymers for near-infrared (near IR) holographic recording: three members of the tertiary nitrosoalkanes (RNO) dissolved in two different poly(alkyl ..cap alpha..-cyanoacrylates) (p-(alkyl-CAc)). Absorption/transmission spectroscopy, a CW holographic technique (PIH), and a newly developed phase-sensitive holographic technique, phase-modulated holography (PMH), were employed in these investigations. The last technique is an ideal tool for the investigation of photopolymer systems because it allows one to monitor separately and simultaneously the amplitude and phase contributions to the holographic grating and thus to monitor simultaneously the photoreaction of the RNO and the resulting holographic recording mechanism. The RNO in p-(alkyl-CAc) undergo a homolytic dissociation after absorption of one photon at wavelengths up to 799 nm. The corresponding photochemical rates, the quantum yields, and the activation energies were determined and were found to depend strongly on the glass transition temperature of the polymer solvent. However, hologram formation arises not only from the photoreaction of the RNO but mainly from a photoinduced expansion of the polymer matrix, i.e., a photomechanical effect. The resulting density change, which is associated with a large change of refractive index, does not depend on the RNO but on the matrix only. The near-IR holographic sensitivities of the new photopolymers were determined. They are high due to the considerable photomechanical effect, allowing one to write holographic gratings with a GaAlAs semiconductor laser at 788 nm.

• Research Organization: Universitaet Muenchen, Germany, F.R.
• OSTI ID: 5527111
• Journal Information: J. Am. Chem. Soc.; (United States), Journal Name: J. Am. Chem. Soc.; (United States) Vol. 109:21; ISSN JACSA
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400500* -- Photochemistry
ACTIVATION ENERGY
ALKANES
CHEMICAL REACTION KINETICS
CHEMICAL REACTION YIELD
CHEMISTRY
DATA
ELECTROMAGNETIC RADIATION
ENERGY
EXPERIMENTAL DATA
HOLOGRAPHY
HYDROCARBONS
INFORMATION
INFRARED RADIATION
KINETICS
LASERS
NEAR INFRARED RADIATION
NITROSO COMPOUNDS
NUMERICAL DATA
ORGANIC COMPOUNDS
ORGANIC NITROGEN COMPOUNDS
PHOTOCHEMISTRY
RADIATIONS
REACTION KINETICS
SEMICONDUCTOR DEVICES
SEMICONDUCTOR LASERS
YIELDS