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On extrinsic effects in the surface impedance of cuprate superconductors by weak links

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.350711· OSTI ID:5526694
 [1]
  1. Kernforschungszentrum Karlsruhe, Institut fuer Materialforschung I, Postfach 36 40, 7500 Karlsruhe (Germany)
The reported rf surface impedance of superconducting cuprates continues to drop with 2 years of improving material quality. As leading indicator for quality the weak-link critical current {ital j}{sub {ital cJ}}({ital T}{approx} 0, {ital B} {approx} 0) has grown from 10{sup 2} to 10{sup 6} A/cm{sup 2} and thus the Josephson penetration depth {lambda}{sub {ital J}} {proportional to} 1/{radical}{ital j}{sub {ital cJ}} and the excess normal (leakage) tunnel current {ital j}{sub {ital bl}} are shrinking. This {ital j}{sub {ital cJ}} growth has now saturated, whereas the rf residual surface impedance {ital Z}{sub res} is still shrinking with material improvements. This shows clearly that {ital Z}{sub res} is an extrinsic property. Evidence that {ital Z}{sub res} is due to the large leakage current {ital j}{sub {ital bl}} and the small {ital j}{sub {ital cJ}} of weak links, where the latter destroys the intrinsic shielding from a {lambda}{sub {ital I}} thin-seam {lambda}{sub {ital J}} deep into the bulk, is presented. This causes rf residual losses {ital R}{sub res} {approx} ({omega}{mu}{sub 0}){sup 2}{lambda}{sub {ital J}}{sup 3}{sigma}{sub {ital bl}}/2. {ital R}{sub res} stays finite at {ital T} {congruent} 0 by {sigma}{sub {ital b}{ital l}}({ital T} {r arrow} 0) {approx} {sigma}{sub {ital bl}} ({proportional to}{ital j}{sub {ital bl}}) being amplified by ({lambda}{sub {ital J}}/{lambda}{sub {ital I}}){sup 3} {gt} 10{sup 3} as a weighting factor. With slow crystal growth weak links are improved and their density is reduced so that {ital R}{sub res} values better than {ital R}{sub Nb}(4.2 K) are now obtainable.
OSTI ID:
5526694
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 71:1; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English