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Studies of total ionization in gases/mixtures of interest to pulsed power applications

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.337792· OSTI ID:5524515
The energy required to produce an electron-ion pair (i.p.), W, for the ..cap alpha..-particle irradiated gases CF/sub 4/, C/sub 2/F/sub 6/, C/sub 3/F/sub 8/, and n-C/sub 4/F/sub 10/ has been measured and found to be 34.3, 34.5, 34.4, and 34.2 eV/ i.p., respectively. The large values of W for these perfluorocarbons (PFCs) are attributed to their large cross sections for electron impact-induced dissociation. The constancy of W for this group of molecules is discussed with respect to the constancy of the ratio (approx.0.68) of the respective (energy integrated) total ionization cross section to the total (energy integrated) inelastic scattering cross section. W values are also reported for the binary gas mixtures Ar/CF/sub 4/, Ar/C/sub 2/F/sub 6/, Ar/C/sub 3/F/sub 8/, and CH/sub 4//CF/sub 4/ which have conduction and insulation properties suitable for use in diffuse discharge opening switches. The W values for these binary mixtures (and for C/sub 2/H/sub 2//CF/sub 4/, C/sub 2/H/sub 2//C/sub 2/F/sub 6/, and C/sub 2/H/sub 2//C/sub 3/F/sub 8/) increase with the amount of PFCs in the mixture and (contrary to the Ar/C/sub 2/H/sub 2/ mixture) exhibit no Jesse effect. The ternary gas mixtures Ar/C/sub 2/H/sub 2//PFC ( = CF/sub 4/, C/sub 2/F/sub 6/, C/sub 3/F/sub 8/) containing < or approx. =10% PFC were found to exhibit a pronounced Jesse effect which is a function of the content of the PFC in the mixture and the electron scattering cross section of the PFC itself. Substantial increases in ionization can be achieved by adding to the Ar/PFC binaries 1-3% of C/sub 2/H/sub 2/.
Research Organization:
Atomic, Molecular and High Voltage Physics Group, Health and Safety Research Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831
DOE Contract Number:
AC05-84OR21400
OSTI ID:
5524515
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 60:2; ISSN JAPIA
Country of Publication:
United States
Language:
English