Optical properties of thin films deposited be reactive-Rf-magnetron sputtering
Conference
·
OSTI ID:552270
- Osaka Institute of Technology (Japan); and others
Optical coatings deposited by conventional evaporation processes have a number of shortcomings including weak adhesion which depends upon the subsurface condition of substrate, and the change of spectral characteristics and film stress in the relative humidity. Thin films coated by reactive-rf-magnetron sputtering improve these problems. In this paper, optical properties (such as surface roughness and stress) of thin films deposited by reactive-rf-magnetron sputtering are presented.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- OSTI ID:
- 552270
- Report Number(s):
- CONF-961070--Vol.2966
- Country of Publication:
- United States
- Language:
- English
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