Comparative studies on titanium and tantalum oxides thin film structures for laser mirrors, deposited by ion assisted gun
- Kobe Design Univ. (Japan)
For obtaining radiation less damagable laser mirrors, a preliminary optimization of film fabrication suitable for the analysis of laser damage mechanism has been done as the first step. Here, the optimization requires not only the stable fabrication process but also the ideal film structure i.e., the amorphous and smooth film structure simultaneously, eliminating latently unwanted secondary effects such as light scattering during laser damage test. For this purpose, we adopted the ion assisted deposition (IAD) method and modified the deposition conditions for titanium and tantalum oxide films, both of which compose typical high index layers, and where SiO{sub 2} layers are also chosen as low index layers because of their amorphous and smooth nature, in alternative multilayer laser mirrors. Surface and cross sectional film structures and film crystallinity are compared and characterized, using a high resolution SEM and a x-ray diffractometer, respectively. The fabrication process and the film structures obtained even by LAD method for tantalum pentaoxide lack stability similar to those films by a conventional EB method. The fabrication process for titanium oxide films are stable even by a conventional EB method, but it produces the columnar film morphology and rough film surface and layer boundary simultaneously. Therefore, further optimization of titanium films, has been done by IAD method to improve the film morphology, introducing new fabrication parameters such as the determination of the best starting material among various titanium oxides, adopting the new mixed gases of Ar and oxygen, suitable input power for ion gun, and arrival ratio of the ionized vapor ions. Then the structure of titanium oxide films can be amorphous and smooth at layer boundaries only if choosing appropriate deposition conditions of the ratios of oxygen and argon gases and ion power of 500 to 750 V during the titanium oxide deposition at the substrate temperature of 100 to 150 {degrees}C.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- OSTI ID:
- 552269
- Report Number(s):
- CONF-961070-Vol.2966; TRN: 98:009077
- Resource Relation:
- Conference: 28. annual symposium on optical materials for high power lasers - Boulder damage symposium, Boulder, CO (United States), 7-9 Oct 1996; Other Information: PBD: [1997]; Related Information: Is Part Of Laser-induced damage in optical materials: 1996. Twenty-eighth annual Boulder damage symposium, proceedings; Bennett, H.E.; Guenther, A.H.; Kozlowski, M.R.; Newnam, B.E.; Soileau, M.J. [eds.]; PB: 686 p.
- Country of Publication:
- United States
- Language:
- English
Similar Records
Design and development of laser damage resistant low group delay dispersion optical coatings for high reflection at 45o incidence P polarization and wavelengths from 800 to 1000 nm.
Optical, chemical and protective properties of thin films produced by ion-assisted deposition