Influence of substrate cleaning on LIDT of 355 nm HR coatings
Conference
·
OSTI ID:552265
- LETI-CEA-DOPT-Couches Minces pour l-Optique (CMO), Grenoble (France)
- Fraunhofer Institute of Applied Optics and Precision Engineering, Jena (Germany)
An advanced high-purity reactive e-beam evaporation process was used to deposit Al{sub 2}O{sub 3}/SiO{sub 2} BR coatings for 355 nm (Nd:YAG third harmonic) high-power laser applications. Both 1:1 and R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal (0{degrees}) and non-normal (45{degrees}) incident designs were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm{sup 2}. Post-cleaning of coated substrates degrades LIDT.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- OSTI ID:
- 552265
- Report Number(s):
- CONF-961070--Vol.2966; CNN: Project 13EU 0131; Project LU 9303; Project 16 SV 191
- Country of Publication:
- United States
- Language:
- English
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