Damage fluence at 1054 nm and 351 nm of coatings made with hafnium oxide evaporated from metallic hafnium
Conference
·
OSTI ID:552209
- Univ. of Rochester, NY (United States); and others
Hafnium oxide can be reactively deposited by e-beam evaporation directly from a metallic hafnium melt. Films produced in this manner can have low absorptive losses, low defect densities, and high damage thresholds. Evaporation of hafnia, in this form allows for more precise control of rate and variation of the vapor plume. Thus, multilayer films of metal-converted hafnia and conventionally deposited silicon dioxide can be used for designs that require precise control of optical thickness and a high degree of uniformity. One such design, a polarizing beam splitter used for the OMEGA Upgrade, was produced using the hafnia/silica combination. These coatings have stringent optical requirements, are placed in the stages of the laser with the highest fluence at 1054 nm, and are required to have a low net stress to produce low wavefront distortion. Hafnia/silica coatings are also more stable than other film combinations such as tantala/silica. Hafnia/silica films were investigated for other applications. A triple wavelength (351, 527, and 1054 nm) antireflection coating was developed for calorimeter absorption glass. The metal-converted hafnia is also used on selected transport mirrors used at 351 nm and angles of incidence up to 45{degrees}. Damage test results for 1054 nm, 1 ns, and 351 nm, 0.7 ns will be presented.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- DOE Contract Number:
- FC03-92SF19460
- OSTI ID:
- 552209
- Report Number(s):
- CONF-9410155--Vol.2428
- Country of Publication:
- United States
- Language:
- English
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