Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Damage fluence at 1054 nm and 351 nm of coatings made with hafnium oxide evaporated from metallic hafnium

Conference ·
OSTI ID:552209
; ;  [1]
  1. Univ. of Rochester, NY (United States); and others
Hafnium oxide can be reactively deposited by e-beam evaporation directly from a metallic hafnium melt. Films produced in this manner can have low absorptive losses, low defect densities, and high damage thresholds. Evaporation of hafnia, in this form allows for more precise control of rate and variation of the vapor plume. Thus, multilayer films of metal-converted hafnia and conventionally deposited silicon dioxide can be used for designs that require precise control of optical thickness and a high degree of uniformity. One such design, a polarizing beam splitter used for the OMEGA Upgrade, was produced using the hafnia/silica combination. These coatings have stringent optical requirements, are placed in the stages of the laser with the highest fluence at 1054 nm, and are required to have a low net stress to produce low wavefront distortion. Hafnia/silica coatings are also more stable than other film combinations such as tantala/silica. Hafnia/silica films were investigated for other applications. A triple wavelength (351, 527, and 1054 nm) antireflection coating was developed for calorimeter absorption glass. The metal-converted hafnia is also used on selected transport mirrors used at 351 nm and angles of incidence up to 45{degrees}. Damage test results for 1054 nm, 1 ns, and 351 nm, 0.7 ns will be presented.
Research Organization:
International Society for Optical Engineering, Washington, DC (United States)
DOE Contract Number:
FC03-92SF19460
OSTI ID:
552209
Report Number(s):
CONF-9410155--Vol.2428
Country of Publication:
United States
Language:
English

Similar Records

High-laser-induced-damage threshold polarizer coatings for 1054 nm
Conference · Sun Nov 30 23:00:00 EST 1997 · OSTI ID:552274

Optimization of Laser-Damage Resistance of Evaporated Hafnia Films at 351 nm
Journal Article · Tue Apr 07 00:00:00 EDT 2009 · Laser-Induced Damage in Optical Materials: 2008 · OSTI ID:950855

Stress and environmental shift characteristics of HfO{sub 2}/SiO{sub 2} multilayer coatings
Conference · Sun Nov 30 23:00:00 EST 1997 · OSTI ID:552275