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Level excitation cross sections of Si I fragments produced by 100 eV electron impact on SiH/sub 4/

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:5512631
The fluorescence decay Si I atomic lines after electron impact excitation of SiH/sub 4/ molecular gas was observed, and the level excitation cross sections (LECS) of Si I fragments were determined by separating the contribution from cascade transitions to line emissions. Observed transitions were 4s /sup 1/P--3p/sup 2/ /sup 1/D, 4s /sup 3/P--3p/sup 2/ /sup 3/P, 3d /sup 1/P--3p/sup 2/ /sup 1/S, 3d /sup 1/D--3p/sup 2/ /sup 1/D, 3d /sup 1/F--3p/sup 2/ /sup 1/D, 3d /sup 3/P--3p/sup 2/ /sup 3/P, and 3p/sup 3/ /sup 3/D--3p/sup 2/ /sup 3/P, for which the LECSs of the upper levels were determined at 100 eV excitation energy. The contribution of the direct excitations to these line emissions were found to range from 37% to 80%. Analysis of the 4s /sup 1/P--3p/sup 2/ /sup 1/D decay curve also gave the LECSs of the cascading levels 4p /sup 1/P, 4p /sup 1/S, and 4p /sup 1/D. Also obtained were some radiative lifetimes not reported before.
Research Organization:
Department of Electronics, Faculty of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464, Japan
OSTI ID:
5512631
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 88:1; ISSN JCPSA
Country of Publication:
United States
Language:
English