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U.S. Department of Energy
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Preparation of low-silicon vanadium metal

Conference ·
OSTI ID:5497401

A modified method for preparing high purity vanadium metal by the aluminothermic reduction of V/sub 2/O/sub 5/ oxide in a water-cooled copper crucible is described. Experiments designed to prepare low-silicon vanadium directly from commercial grade V/sub 2/O/sub 5/ show promise of simplifying the process for producing this material on a commercial scale. A vanadium-oxygen alloy is first prepared and then double electron-beam melted into platelet form during which SiO is removed by volatilization. Residual oxygen is removed from the platelets by a calcium deoxidation procedure. Experiments in which V/sub 2/O/sub 5/ is added to commercial vanadium metal to lower its silicon content by similar processing are also described. Silicon in amounts up to 1000 wt ppM was found to have a rather small effect on the hardness, yield and tensile strength and ductility of vanadium.

Research Organization:
Ames Lab., IA (USA)
DOE Contract Number:
W-7405-ENG-82
OSTI ID:
5497401
Report Number(s):
IS-M-552; CONF-8406267-1; ON: DE85015516
Country of Publication:
United States
Language:
English