Oxidative photobleaching of substituted anthracenes in thin polymer films
- Hewlett Packard Labs., Palo Alto, CA (USA)
The photochemical reaction of diphenylanthracene (DPA) and dimethylanthracene (DMA) in thin spin-cast films of various polymers in the presence of oxygen, with direct irradiation as well as triplet sensitization, is reported. Kinetic equations are derived and used in conjunction with the analytical results of Sheats, Diamond, and Smith to determine reaction parameters from the optical transmittance data. Triplet yields are about 40%. The oxidation rates are substantially lower than in solution, more so for DMA than for DPA. The rate for DPA in poly(ethyl methacrylate) (PEMA) is similar to that in poly(diphenylsiloxane) (PDPS), while in poly(butyl methacrylate) (PBMA) it is significantly faster.
- OSTI ID:
- 5478785
- Journal Information:
- Journal of Physical Chemistry; (United States), Journal Name: Journal of Physical Chemistry; (United States) Vol. 94:18; ISSN 0022-3654; ISSN JPCHA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
400201* -- Chemical & Physicochemical Properties
ANTHRACENE
AROMATICS
CHEMICAL REACTIONS
CONDENSED AROMATICS
DATA
EXPERIMENTAL DATA
FILMS
HYDROCARBONS
INFORMATION
KINETICS
NUMERICAL DATA
ORGANIC COMPOUNDS
OXIDATION
PHOTOCHEMICAL REACTIONS
POLYMERS
THIN FILMS