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X-ray depth profiling of iron oxide thin films

Journal Article · · J. Mat. Res.; (United States)
A nominally ..gamma..-Fe/sub 2/O/sub 3/ thin film (oxidized from an Fe/sub 3/O/sub 4/ film) has been structurally depth profiled using x-ray scattering in a grazing incidence, asymmetric Bragg geometry. By varying the grazing incidence angle, the x-ray penetration depth is varied from tens of Angstroms to several thousand Angstroms, slightly larger than the film thickness. At small incidence angles a diffraction pattern characteristic of ..cap alpha..-Fe/sub 2/O/sub 3/ is observed, while at larger angles the pattern is predominantly from ..gamma..-Fe/sub 2/O/sub 3/, showing that there is a surface layer of ..cap alpha..-Fe/sub 2/O/sub 3/. These results are quantified and the thickness of the ..cap alpha.. phase found to be 90 A. The presence of the ..cap alpha.. phase explains a nonferromagnetic layer observed previously. These data together with magnetic and chemical data suggest that the nonferromagnetic layer forms during oxidation of the Fe/sub 3/O/sub 4/ film due to outward diffusion of Fe ions and their subsequent oxidation to form ..cap alpha..-Fe/sub 2/O/sub 3/
Research Organization:
IBM Almaden Research Center, San Jose, California 95120
OSTI ID:
5451414
Journal Information:
J. Mat. Res.; (United States), Journal Name: J. Mat. Res.; (United States) Vol. 3:2; ISSN JMREE
Country of Publication:
United States
Language:
English