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Growth and breakdown of passive films on metal surfaces

Technical Report ·
OSTI ID:5450569
A model based on oxide defect theory is developed for the growth of passive films on metals in aqueous environments. Growth of the film occurs as the result of inward diffusion of oxide ions, while outward diffusion of cations results in their dissolution in the environment. The electric field in the passive film is assumed to be constant, limited by dielectric breakdown in the oxide. Rate laws derived from this theory are in good agreement with experimental film growth values. The breakdown of passivity by aggressive anions, such as chloride, is also treated. Values for the critical breakdown potential and induction time for pit initiation from the model are in good agreement with literature experimental data. Measured values of film growth on some Fe-Cu-Ni alloys by ellipsometry were used with the model to evaluate the electric fields in the films.
Research Organization:
Ohio State Univ. Research Foundation, Columbus (USA)
OSTI ID:
5450569
Report Number(s):
EPRI-NP-4069M; ON: TI85920820
Country of Publication:
United States
Language:
English