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Effect of ultraviolet light irradiation on amorphous carbon nitride films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.366356· OSTI ID:544785
;  [1]
  1. Department of Physics and Electronics, Osaka Prefecture University, Osaka 599 (Japan)
The amorphous carbon nitride films were produced using electron cyclotron resonance nitrogen plasma with various mixtures of N{sub 2} and CH{sub 4} gases. The dependence of film structures on the nitrogen incorporation and the structural modifications of the film due to ultraviolet (UV) light irradiation were investigated using infrared and UV-VIS spectroscopy. It is found that UV irradiation results in the decrease of CH bonding, increase of CC and CN double bonding in the film and increase of the optical band gap of the film. It appears that both bond removal and reordering have taken place as a result of UV irradiation. The structural modifications due to nitrogen incorporation and UV light irradiation are explained by a cluster model. {copyright} {ital 1997 American Institute of Physics.}
OSTI ID:
544785
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 82; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English