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Effects of He implantation on radiation induced segregation in Cu-Au and Ni-Si alloys

Conference ·
OSTI ID:543621
 [1]; ; ;  [1]
  1. Argonne National Lab., IL (United States)
Effects of He implantation on radiation induced segregation (RIS) in Cu-Au and Ni-Si alloys were investigated using in-situ Rutherford backscattering spectrometry during simultaneous irradiation with 1.5-MeV He and low-energy (100 or 400-keV) He ions at elevated temperatures. RIS during single He ion irradiation, and the effects of pre-implantation with low-energy He ions, were also studied. RIS near the specimen surface, which was pronounced during 1.5-MeV He single-ion irradiation, and during simultaneous irradiation with 1.5-MeV He and low-energy He ions. A similar RIS reduction was also observed in the specimens pre-implanted with low-energy He ions. The experimental results indicate that the accumulated He atoms cause the formation of small bubbles, which provide additional recombination sites for freely migrating defects.
Research Organization:
Argonne National Lab., IL (United States)
Sponsoring Organization:
USDOE Office of Energy Research, Washington, DC (United States)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
543621
Report Number(s):
ANL/MSD/CP--94538; CONF-971090--; ON: DE98000640
Country of Publication:
United States
Language:
English