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Gas adsorption on microporous carbon thin films

Journal Article · · Langmuir; (United States)
DOI:https://doi.org/10.1021/la00041a029· OSTI ID:5425574

A gas adsorption study was performed on amorphous hydrogenated carbon thin films which are deposited by reactive magnetron sputtering using acetylene gas. It is found that the films are highly microporous. Annealing significantly increases the adsorption capacity of the films and decreases the effects of low-pressure hysteresis in the adsorption isotherms. The general gas adsorption behavior closely resembles that of powdered activated carbons. The Dubinin-Radushkevich equation can be used to model the submonolayer adsorption isotherm for a variety of gases. 38 refs., 9 figs., 3 tabs.

OSTI ID:
5425574
Journal Information:
Langmuir; (United States), Journal Name: Langmuir; (United States) Vol. 8:5; ISSN LANGD5; ISSN 0743-7463
Country of Publication:
United States
Language:
English