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Microscopic investigation of NbN sputtered films

Conference ·
OSTI ID:5425286
Many favorable properties of niobium nitride (NbN) sputtered films for high field magnets are significantly less favorable in bulk NbN (and other high-field superconductors) so that differences in the microstructure of sputtered NbN films are likely responsible for the improvements. Very thin transverse sections of sputtered films were studied by TEM. Such studies reveal columnar grains. We report tunneling measurements that directly investigate T/sub c/ and the energy gap of individual grains. By placing electrodes above and below the film, preliminary measurements of the intrinsic resistivity of the individual columnar grains indicate values significantly less than the transport value. Measurements of the critical current density, J/sub c/, in NbN suggest that shearing of the flux line lattice does not limit J/sub c/, as in A-15 superconductors, no doubt due to the high density of pinning centers in NbN.
Research Organization:
Argonne National Lab., IL (USA)
DOE Contract Number:
W-31109-ENG-38
OSTI ID:
5425286
Report Number(s):
CONF-8505138-11; ON: DE85015000
Country of Publication:
United States
Language:
English