Cryogenic gas purification process and apparatus
Patent
·
OSTI ID:5424024
This patent describes a process for the ultrapurification of cryogenic low boiling liquified gases containing trace impurities. It comprises: introducing the cryogenic gas to be purified into a first distillation column, the cryogenic gas to be purified being substantially at its liquid-gas equilibrium temperature at the pressures within the first distillation column; separating the cryogenic feed by distillation into a first cryogenic vapor fraction containing low boiling point impurities and a first cryogenic liquid fraction containing high boiling point impurities; withdrawing the first cryogenic vapor fraction from the first distillation column; introducing the first cryogenic vapor fraction into a second distillation column, the first cryogenic vapor fraction being substantially at its liquid-gas equilibrium temperature at the pressures within the second distillation column; separating the first vapor fraction by distillation into a second vapor fraction containing low boiling point impurities and a second liquid fraction free of trace impurities; and, withdrawing the second liquid fraction free of trace impurities as ultrapure product.
- Assignee:
- Liquid Air Engineering Corp., Walnut Creek, CA
- Patent Number(s):
- US 4867772
- Application Number:
- PPN: US 7277550A
- OSTI ID:
- 5424024
- Country of Publication:
- United States
- Language:
- English
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