Metallographic preparation of titanium diboride coatings

Technical Report · Sat Mar 01 04:00:00 EST 1980

DOI:https://doi.org/10.2172/5417732· OSTI ID:5417732

McAllaster, M. E.

A method is described for preparing metallographic cross sections of thin, hard, chemically vapor deposited titanium diboride coatings on various softer substrates. Standard metallographic preparation techniques were found to result in fracturing and edge rounding of the coatings. It is shown that these problems can be avoided by unidirectional grinding on worn 600 grit silicon carbide abrasive paper. Typical photomicrographs of chemically vapor deposited titanium diboride coatings are shown along with photomicrographs of intermediate phases that form at the titanium diboride - substrate interfaces.

• Research Organization: Sandia National Labs., Albuquerque, NM (USA)
• DOE Contract Number: EY-76-C-04-0789
• OSTI ID: 5417732
• Report Number(s): SAND-80-0596
• Country of Publication: United States
• Language: English

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ALLOYS
BORIDES
BORON COMPOUNDS
CARBIDES
CARBON
CARBON COMPOUNDS
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COAL GASIFICATION
COMMINUTION
COPPER ALLOYS
DEPOSITION
ELEMENTS
EROSION
FAILURES
FRACTURES
GASIFICATION
GRAPHITE
GRINDING
IRON ALLOYS
IRON BASE ALLOYS
MACHINING
METALLOGRAPHY
NICKEL ALLOYS
NONMETALS
POLISHING
SILICON CARBIDES
SILICON COMPOUNDS
STEELS
SUBSTRATES
SURFACE COATING
SURFACE FINISHING
THERMOCHEMICAL PROCESSES
THERMONUCLEAR REACTORS
TITANIUM BORIDES
TITANIUM COMPOUNDS
TOKAMAK TYPE REACTORS
TRANSITION ELEMENT COMPOUNDS